GATE Papers >> ECE >> 2018 >> Question No 30

Question No. 30 ECE | GATE 2018

There are two photolithography systems: one with light source of wavelength $ \lambda_1=156 $ nm (System 1) and another with light source of wavelength $ \lambda_2=325 $ nm (System 2). Both photolithography systems are otherwise identical. If the minimum feature sizes that can be realized using System1 and System2 are $ L_{min1} $ and $ L_{min2} $ respectively, the ratio $ L_{min1}/L_{min2} $ (correct to two decimal places) is__________.


Answer : 0.47 to 0.51


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