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Question No. 30

There are two photolithography systems: one with light source of wavelength $\lambda_1=156$ nm (System 1) and another with light source of wavelength $\lambda_2=325$ nm (System 2). Both photolithography systems are otherwise identical. If the minimum feature sizes that can be realized using System1 and System2 are $L_{min1}$ and $L_{min2}$ respectively, the ratio $L_{min1}/L_{min2}$ (correct to two decimal places) is__________.